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Maskless photolithography using UV LEDs

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Guijt, RM and Breadmore, MC (2008) Maskless photolithography using UV LEDs. Lab on a Chip, 8 (8). pp. 1402-1404. ISSN print 1473-0197; online 1473-0189

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Abstract

A UV light emitting diode (LED) with a maximum output of 372 nm was collimated using a pinhole and a small plastic tube and focused using a microscope objective onto a substrate for direct lithographic patterning of the photoresist. Movement of the substrate with a motorised linear stage (syringe pump) allowed lines in SU-8 to be pattered with a width down to 35 {micro}m at a linear velocity of 80 {micro}m s-1, while in the dry film resist Ordyl SY 330, features as narrow as 17 {micro}m were made at a linear velocity of 245 {micro}m s-1. At this linear velocity, a 75 mm long feature could be patterned in 5 min. Functional microfluidic devices were made by casting PDMS on a master made by LED lithography. The results show that UV LEDs are a suitable light source for direct writing lithography, offering a budget friendly, and high resolution alternative for rapid prototyping of features smaller than 20 {micro}m.

Item Type: Article
Journal or Publication Title: Lab on a Chip
Page Range: pp. 1402-1404
ISSN: print 1473-0197; online 1473-0189
Identification Number - DOI: 10.1039/b800465j
Additional Information:

© Royal Society of Chemistry 2008

Date Deposited: 25 Aug 2008 23:30
Last Modified: 18 Nov 2014 03:48
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