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Abstract

A dual-wavelength photopolymerization process is presented, allowing for the volumetric fabrication of complex geometries using a multistep process. The methacrylate-based resin contained 0.1 wt % camphorquinone/0.1 wt % ethyl 4-(dimethylamino) benzoate and 0.2 wt % bis[2-(ochlorophenyl)-4,5-diphenylimidazole] as photoinitiator (473 nm) and photoinhibitor (365 nm), respectively. The photoinitiator and photoinhibitor concentrations were optimized to allow for photocuring to full depth (4.6 mm) following an exposure time of 2 min solely by 473 nm light, but no curing occurred when 365 nm light was present due to photoinhibition. This resin was validated using one-step volumetric fabrication of two objects containing voids defined by the 365 nm irradiation region. Two more complex structures were printed in a step-by-step manner, relying on the dynamic control of the projection patterns of both 365 and 473 nm projectors, decreasing the print time from 20 min using a commercially available single wavelength resin printer to 2 min.

Item Type:	Article
Authors/Creators:	Li, F and Thickett, SC and Maya, F and Doeven, EH and Guijt, RM and Breadmore, MC
Keywords:	analytical chemistry
Journal or Publication Title:	ACS Macro Letters
Publisher:	American Chemical Society
ISSN:	2161-1653
DOI / ID Number:	https://doi.org/10.1021/acsmacrolett.0c00465
Copyright Information:	Copyright 2020 American Chemical Society
Related URLs:	Google Scholar: Thickett, SC UTAS Profile: Thickett, SC Google Scholar: Maya, F Google Scholar: Guijt, RM UTAS Profile: Guijt, RM Google Scholar: Breadmore, MC UTAS Profile: Breadmore, MC
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